Dr. Hemant Kumar Chourasiya

@iuac.res.in

Research Associate
Inter-University Accelerator Center, New Delhi



                          

https://researchid.co/hemantchourasiya22

EDUCATION

Ph.D. (Physics) from Central University of Rajasthan
M.Sc. (Physics) from Dr. Harisingh Gour University, Sagar, (MP)
B.Sc. (Maths, Physics, Electronics) from Rani Durgavati University, Jabalpur, (MP)

RESEARCH, TEACHING, or OTHER INTERESTS

Condensed Matter Physics, Materials Science, Electronic, Optical and Magnetic Materials, Radiation

3

Scopus Publications

23

Scholar Citations

2

Scholar h-index

1

Scholar i10-index

Scopus Publications

RECENT SCHOLAR PUBLICATIONS

  • In-situ study of electrical transport in Pd/n-Si under high energy ion irradiation
    HK Chourasiya, PK Kulriya, N Panwar, S Kumar
    Semiconductor Science and Technology 35 (8), 085004 2020

  • Influence of barrier inhomogeneities on transport properties of Pt/MoS2 Schottky barrier junction
    S Kumar, A Sanger, HK Chourasiya, A Kumar, K Asokan, R Chandra, ...
    Journal of Alloys and Compounds 797, 582-588 2019

  • Analysis of the carrier conduction mechanism in 100 MeV O7+ ion irradiated Ti/n-Si Schottky barrier structures
    HK Chourasiya, PK Kulriya, N Panwar, S Kumar
    Nuclear Instruments and Methods in Physics Research Section B: Beam 2019

MOST CITED SCHOLAR PUBLICATIONS

  • Influence of barrier inhomogeneities on transport properties of Pt/MoS2 Schottky barrier junction
    S Kumar, A Sanger, HK Chourasiya, A Kumar, K Asokan, R Chandra, ...
    Journal of Alloys and Compounds 797, 582-588 2019
    Citations: 16

  • Analysis of the carrier conduction mechanism in 100 MeV O7+ ion irradiated Ti/n-Si Schottky barrier structures
    HK Chourasiya, PK Kulriya, N Panwar, S Kumar
    Nuclear Instruments and Methods in Physics Research Section B: Beam 2019
    Citations: 5

  • In-situ study of electrical transport in Pd/n-Si under high energy ion irradiation
    HK Chourasiya, PK Kulriya, N Panwar, S Kumar
    Semiconductor Science and Technology 35 (8), 085004 2020
    Citations: 2